发明名称 |
METHOD AND DEVICE FOR PROCESSING FINE CAVITY IN TRANSPARENT DIELECTRIC MATERIAL BY USE OF LIGHT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for processing a fine cavity by the use of light, by which a long hole having a diameter of from several tens of micron to submicron can be formed in a transparent dielectric material. SOLUTION: In the device for processing the fine cavity in the transparent dielectric material by the use of light, the transparent dielectric material 5, a liquid 6 being brought into contact with an end face of the transparent dielectric material 5, an ultrashort light pulse irradiation means 1 capable of irradiating from an interface between the end face of the transparent dielectric material 5 and the liquid 6 to the other end face of the transparent dielectric material 5 while scooching, and an imaging means 9 for imaging the processed conditions of the fine cavity formed by the ultrashort light pulse irradiation are provided.</p> |
申请公布号 |
JP2003020258(A) |
申请公布日期 |
2003.01.24 |
申请号 |
JP20010204516 |
申请日期 |
2001.07.05 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY CORP |
发明人 |
ITO KAZUYOSHI;WATANABE REKI;RI EN |
分类号 |
B23K26/00;B23K26/06;B23K26/38;C03C23/00;(IPC1-7):C03C23/00 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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