| 摘要 |
PROBLEM TO BE SOLVED: To provide an MEMS element having a membrane of such a constitution that it is not damaged in etching to remove a sacrificial layer when silicon, such as polysilicon and amorphous silicon, is used as the sacrificial layer. SOLUTION: This MEMS element 30 is constituted as an optical modulation element constituting a GVL device and has the same constitution as the constitution of the conventional MEMS element except that the structure of a bridge member 34 of the membrane 32 is different. The membrane 32 comprises the bridge member 34 which has an SiO2 film 36 of 20 nm in film thickness as a lower layer and is laminated with an SiN film 38 of, for example, 100 nm in film thickness thereon and a membrane side electrode 14 commonly used as a light reflection surface consisting of an Al film of 100 nm in film thickness formed on the bridge member 34. The SiO2 film 36 may be an SiO2 film formed by thermally oxidizing the sacrificial layer consisting of the polysilicon or an SiO2 film deposited by a CVD process or PVD process. |
