NORMAL BLOCK DIVISION TYPE INTEGRATED CIRCUIT DEVICE, EXPOSURE MASK DEVICE USED FOR THE SAME, AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To solve the problem that a glass mask used in an exposure process becomes very expensive as the micronization of an integrated circuit device advances, production can not be carried out at a practical cost unless a considerable production quantity is secured and high performance and high functionalities provided by the micronization cannot be utilized fully by a method over a conventional integrated circuit design which is suited to large item small volume production. SOLUTION: Respective function blocks are loaded on respective normal blocks for which the integrated circuit device is normalized in a fixed area. Also, the glass mask is turned into a constitution of a normal block unit with exposure being repeated by each block unit.