发明名称 GaAs-BASED SEMICONDUCTOR FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a method for reducing a pulse delay phenomenon (gate leg in a GaAs-based semiconductor field effect transistor and improving transistor characteristics, such as gate withstand voltage controllability and noise characteristic, etc. SOLUTION: The GaAs-based semiconductor field effect transistor for controlling electron movement between a source electrode and a drain electrode by an input signal to a gate electrode includes an active layer composed of a GaAs-based semiconductor, the source electrode and the drain electrode formed on the active layer and the gate electrode provided on the active layer between the source electrode and the drain electrode, and the film thickness of an oxide of the GaAs-based semiconductor on the active layer is nearly equal to the lattice constant of the GaAs-based semiconductor.
申请公布号 JP2003023015(A) 申请公布日期 2003.01.24
申请号 JP20010206165 申请日期 2001.07.06
申请人 MITSUBISHI ELECTRIC CORP 发明人 KUDO SHOKICHI
分类号 H01L29/43;H01L21/28;H01L21/338;H01L29/778;H01L29/812;(IPC1-7):H01L21/338 主分类号 H01L29/43
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