发明名称 DISCHARGE PLASMA PROCESSING DEVICE AND PROCESSING METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a discharge plasma processing device where an electrode of an ion-based metal used for it is lightened, while maintaining rigidity, heat resistance and discharge characteristics. SOLUTION: In this discharge plasma processing device, a solid dielectric is installed on at least either one of facing surfaces of electrodes facing each other, and a discharge plasma is generated by applying electric field between the electrodes. A material obtained by lighting an iron-based metal is used as a material for the electrodes.
申请公布号 JP2003022898(A) 申请公布日期 2003.01.24
申请号 JP20010206530 申请日期 2001.07.06
申请人 SEKISUI CHEM CO LTD 发明人 IWANE KAZUYOSHI
分类号 H05H1/24;C23C16/50 主分类号 H05H1/24
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