| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve the problem that glass masks used in exposure steps become very expensive in accordance with progress in miniaturization of an integrated circuit device and production at a realistic cost cannot be attained unless a great number of devices are produced. SOLUTION: The same glass mask or reticle is loaded with a plurality of lithographic patterns necessary for exposure steps of production steps. A lithographic pattern necessary for each exposure step is selected, the patterns in the other blocks are shielded from light and exposure is carried out. This is repeated in each production step.</p> |
