BUSHING OF ION IMPLANTING APPARATUS

摘要

PURPOSE: A bushing of an ion implanting apparatus is provided to simply install or uninstall the bushing by simplifying constitution parts while normally maintaining an insulation effect of the bushing, and to reduce cost by decreasing the number of the constitution parts. CONSTITUTION: The bushing includes an outer bushing, a red bushing(22) and a bushing real shield(24). The bushing real shield and an outer shield surrounds a source head to prevent the red bushing from being exposed to the source head so that gas deposition caused by ion beam is avoided. A cylinder(26) is formed in the center of the bushing real shield.