| 摘要 |
PURPOSE: A filtering apparatus of semiconductor fabrication equipment is provided to prevent permeation of filtered bubbles into photoresist by installing a chemical inflow tube and a chemical outflow tube at an upper portion and a lower portion of a filter housing, respectively. CONSTITUTION: A filtering apparatus(300) is formed with a filter(310), a filter housing(350), a chemical inflow tube(320), and a chemical outflow tube(370). The filter(310) is used for removing air bubbles and particles from photoresist. The filter housing(350) is used for covering the filter(310). The chemical inflow tube(320) is used for transferring the photoresist from a transferring pump into the inside of the filter housing(350). The chemical outflow tube(370) is installed at the filter housing(350) in order to transfer the filtered photoresist to the outside.
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