发明名称 |
In-Line system having overlay accuracy measurement function and method for the same |
摘要 |
An in-line system having an overlay measurement function and a method thereof capable of reducing overlay measurement time and simplifying related jobs are disclosed. The system for performing wafer processing comprises an in-line system comprising a stepper for performing alignment and photo-exposure of a wafer and a spinner, in-line connected to the stepper, for performing coating and development of the wafer, and an overlay measurement device, in-line connected to the spinner, for automatically measuring an overlay accuracy of the wafer after wafer development is completed by the spinner.
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申请公布号 |
US2003017630(A1) |
申请公布日期 |
2003.01.23 |
申请号 |
US20020059483 |
申请日期 |
2002.01.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI JAE-YOUNG;PARK TAE-SIN |
分类号 |
H01L21/66;G03F7/20;(IPC1-7):H01L21/66;G01R31/26 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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