发明名称 |
Target for use in magnetron sputtering of nickel for forming metallization films having consistent uniformity through life |
摘要 |
Improved targets for use in DC magnetron sputtering of nickel or like ferromagnetic face-centered cubic (FCC) metals are disclosed for forming metallization films having effective edge-to-edge deposition uniformity of 5%(3sigma) or better. Such targets may be characterized as having: (a) a homogeneous texture mix that is at least 20% of a <200> texture content and less than 50% of a <111> texture content, (b) an initial pass-through flux factor (LPTF) of about 30% or greater; and (c) a homogeneous grain size of about 200 mum or less.
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申请公布号 |
US2003015420(A1) |
申请公布日期 |
2003.01.23 |
申请号 |
US20010823341 |
申请日期 |
2001.03.29 |
申请人 |
ABBURI MURALI;RAMASWAMI SESHADRI |
发明人 |
ABBURI MURALI;RAMASWAMI SESHADRI |
分类号 |
C23C14/34;C23C14/35;C23C14/54;(IPC1-7):C23C14/32;C25B9/00 |
主分类号 |
C23C14/34 |
代理机构 |
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主权项 |
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地址 |
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