发明名称 Verfahren zur Herstellung eines polymerfreien Bereichs auf einem Substrat
摘要 The invention relates to a method for producing a polymer-free area, characterized by applying at least one peelable layer to the substrate, and/or to one or more polymer layer(s) disposed on the substrate, in those areas where a polymer-free area is formed on the substrate by removing the peelable layer. The invention thus provides a method for producing polymer-free bonding areas or, by disposing a diode protecting cap on the polymer-free area of the substrate, a hermetically sealed link between the substrate and the diode protecting cap.
申请公布号 DE10130992(A1) 申请公布日期 2003.01.23
申请号 DE2001130992 申请日期 2001.06.27
申请人 SIEMENS AG 发明人 ROTH, WOLFGANG
分类号 H05B33/10;H01L51/40;H01L51/50;H01L51/52;H01L51/56;H05B33/04 主分类号 H05B33/10
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