发明名称 Positive photosensitive composition
摘要 A positive photosensitive composition comprises: (A) an acid generator capable of generating an acid upon irradiation with one of an actinic ray and a radiation; and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkali developer, wherein the acid generator (A) comprises at least two compounds of a sulfonium salt compound not having an aromatic ring, a triarylsulfonium salt compound, and a compound having a phenacylsulfonium salt structure.
申请公布号 US2003017415(A1) 申请公布日期 2003.01.23
申请号 US20020079414 申请日期 2002.02.22
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KODAMA KUNIHIKO;SATO KENICHIRO
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/038 主分类号 G03F7/004
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