发明名称 |
Positive photosensitive composition |
摘要 |
A positive photosensitive composition comprises: (A) an acid generator capable of generating an acid upon irradiation with one of an actinic ray and a radiation; and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkali developer, wherein the acid generator (A) comprises at least two compounds of a sulfonium salt compound not having an aromatic ring, a triarylsulfonium salt compound, and a compound having a phenacylsulfonium salt structure.
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申请公布号 |
US2003017415(A1) |
申请公布日期 |
2003.01.23 |
申请号 |
US20020079414 |
申请日期 |
2002.02.22 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA KUNIHIKO;SATO KENICHIRO |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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