POSITIVE TYPE RESIST COMPOSITION FOR ELECTRON BEAMS OR X-RAYS

摘要

PURPOSE: Provided is an excellent positive type resist composition for electron beams or X-rays having high sensitivity and high resolution and giving a resist pattern whose profile is rectangular. CONSTITUTION: The positive type resist composition contains a compound which generates an acid when irradiated with electron beams or X-rays, a resin having the residue of a compound having a smaller ionization potential than p-ethylphenol in a group which is released by the action of the acid and having solubility in an alkali developing solution increased by the action of the acid and at least one acetal compound having a specified structure of formula (A) and (B).