发明名称 Process and apparatus for abatement of by products generated from deposition processes and cleaning of deposition chambers
摘要 Method and apparatus for abating F2 from byproducts generated during cleaning of a processing chamber. F2 abatement is efficiently performed by directly injecting H2 in line with a foreline exiting the processing chamber. A tube which is highly resistant to oxidation and corrosive gases, even at high temperature, is connected in line with the foreline as part of the exhaust line of the processing chamber. A cooling jacket may be provided for cooling the tube, since the reaction between F2 and H2 is exothermic. A pressure monitoring arrangement may also be employed to insure that pressure within a hydrogen line, that feed the injection of H2 into the tube, does not exceed a predetermined pressure value.
申请公布号 US2003017087(A1) 申请公布日期 2003.01.23
申请号 US20010908668 申请日期 2001.07.18
申请人 APPLIED MATERIALS INC. 发明人 POKHARNA HIMANSHU;LE PHONG;NEMANI SRINIVAS D.
分类号 B01D53/68;C01B7/19;C23C16/44;(IPC1-7):B01D53/68 主分类号 B01D53/68
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