发明名称 |
METHOD AND APPARATUS FOR USING SCATTEROMETRY TO PERFORM FEEDBACK AND FEED- FORWARD CONTROL |
摘要 |
The present invention provides for a method and an apparatus for using scatterometry to perform feedback and feed-forward control. A processing run of semiconductor devices is performed. Metrology data from the processed semiconductor devices is acquired. Error data is acquired by analyzing the acquired metrology data. A determination is made whether the error data merits modification to the processing of semiconductor devices. A feedback modification of the processing of semiconductor devices is performed in response to the determination that the error data merits modification to the processing of semiconductor devices. A feed-forward modification of the processing of the semiconductor devices is performed in response to the determination that the error data merits modification to the processing of semiconductor devices. |
申请公布号 |
KR20030007935(A) |
申请公布日期 |
2003.01.23 |
申请号 |
KR20027016797 |
申请日期 |
2001.05.09 |
申请人 |
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发明人 |
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分类号 |
H01L21/027;H01L21/66;H01L21/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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