发明名称 SUBSTRATE RECEIVING CONTAINER, SUBSTRATE CARRIER SYSTEM, STORAGE APPARATUS AND GAS SUBSTITUTION METHOD
摘要 PURPOSE: A substrate receiving container, a substrate carrier system, a storage apparatus and a gas substitution method are provided to replace the atmosphere inside the wafer carrier efficiently in a short time while preventing the mixing of foreign matter. CONSTITUTION: A wafer carrier comprises a housing having an open surface on one side, a door fitting to the housing on the open surface, a gas inlet for introducing a gas for replacing atmosphere inside the wafer carrier(200), and a gas suction port for sucking the atmosphere inside the wafer carrier.
申请公布号 KR20030007014(A) 申请公布日期 2003.01.23
申请号 KR20020037782 申请日期 2002.07.02
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 发明人 TOKUNAGA KENJI
分类号 B65D85/00;B65D85/86;B65G49/00;H01L21/00;H01L21/673;(IPC1-7):H01L21/00 主分类号 B65D85/00
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