发明名称 |
SUBSTRATE RECEIVING CONTAINER, SUBSTRATE CARRIER SYSTEM, STORAGE APPARATUS AND GAS SUBSTITUTION METHOD |
摘要 |
PURPOSE: A substrate receiving container, a substrate carrier system, a storage apparatus and a gas substitution method are provided to replace the atmosphere inside the wafer carrier efficiently in a short time while preventing the mixing of foreign matter. CONSTITUTION: A wafer carrier comprises a housing having an open surface on one side, a door fitting to the housing on the open surface, a gas inlet for introducing a gas for replacing atmosphere inside the wafer carrier(200), and a gas suction port for sucking the atmosphere inside the wafer carrier.
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申请公布号 |
KR20030007014(A) |
申请公布日期 |
2003.01.23 |
申请号 |
KR20020037782 |
申请日期 |
2002.07.02 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. |
发明人 |
TOKUNAGA KENJI |
分类号 |
B65D85/00;B65D85/86;B65G49/00;H01L21/00;H01L21/673;(IPC1-7):H01L21/00 |
主分类号 |
B65D85/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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