| 发明名称 |
CLEAN METHOD AND APPARATUS FOR VACUUM HOLDING OF SUBSTRATES |
| 摘要 |
A system for preventing contaminants and particulates from coming into contact with a back side of a workpiece as the workpiece is vacuum held on a chuck or robotic end effector. |
| 申请公布号 |
WO03007346(A2) |
申请公布日期 |
2003.01.23 |
| 申请号 |
WO2002US21828 |
申请日期 |
2002.07.10 |
| 申请人 |
ASYST TECHNOLOGIES, INC. |
发明人 |
KROLAK, MICHAEL |
| 分类号 |
H01L21/00;H01L21/677;H01L21/687 |
主分类号 |
H01L21/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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