LITHOGRAPHY SYSTEM AND METHOD FOR REMOVING PARTICLES FROM RETICLE SURFACE USING THE SAME

摘要

PURPOSE: A lithography system and a method for removing particles from a reticle surface using the same are provided to remove fully the remaining particles from the surface of a reticle by using a cleaning gas injection portion for injecting a cleaning gas and an exhaust portion for absorbing the cleaning gas and the particles. CONSTITUTION: A reticle(10) is loaded on a reticle stage. A cleaning gas injection portion(12) is installed at one side of the reticle(10). A plurality of opaque patterns(10a) are arrayed on a bottom face of the reticle(10). The cleaning gas injection portion(12) is formed at one side of the reticle(10). The cleaning gas injection portion(12) is located at a predetermined angle from a line extended from the surface of the reticle(10). The length of the cleaning gas injection portion(12) is larger than the length of the reticle(10). An exhaust portion(14) is located at the other side of the reticle(10) facing the cleaning gas injection portion(12).