EXPOSURE APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An exposure apparatus for fabricating a semiconductor device is provided to lengthen a lifetime of an output coupler by shifting the output coupler to a horizontal direction. CONSTITUTION: A laser generator(1) is used for generating a laser beam of a desired wavelength such as a KrF laser beam. The laser beam of the laser generator(1) transmits an output coupler(3) or the laser beam is reflected by the output coupler(3). A power source(8) is used for shifting the output coupler(3), horizontally. The power source(8) includes a motor(5) for generating a rotary motion and a power conversion portion(7) for converting the rotary motion to a straight-line motion. The laser beam transmitting the output coupler(3) penetrates a desired reticle. The laser beam transmitting the reticle(9) is irradiated on a semiconductor wafer(15) loaded on a stage(13) through a lens module(11).