发明名称 |
Method and system for manufacturing semiconductor devices |
摘要 |
A system for manufacturing a semiconductor device which predicts a difference in registration error between a circuit pattern and an overlay mark from a pattern dimension, illumination conditions and the wave aberration of an exposure lens, feeds a correction value based on the predicted difference back to an exposure device and modifies an overlay inspection data control limit.
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申请公布号 |
US2003018406(A1) |
申请公布日期 |
2003.01.23 |
申请号 |
US20020198394 |
申请日期 |
2002.07.17 |
申请人 |
HITACHI, LTD. |
发明人 |
YOSHITAKE YASUHIRO;MATSUMOTO SHUNICHI;MIWA TOSHIHARU |
分类号 |
G03F7/20;H01L21/00;H01L21/027;(IPC1-7):G06F19/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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