RESIST COMPOSITIONS

摘要

Practical resist compositions which have high resolution,high sensitivity and good pattern profile suitable for electron beam microlithography or the like and do not cause outgassing even when irradiated with an actinic radiation under high vacuum.Namely,(1)a resist composition composed essentially of at least one polymer comprising monomer units represented by the general formula[1],monomer units represented by the general formula[2],and monomer units represented by the general formula[3]:[1][2][3]at least one compound represented by the general formula[4]which generates an acid by irradiation:[4]an organic basic compound,and a solvent;(2)a resist composition as set forth in item(1)which further contains a polymer represented by the general formula[13]:[13]and(3)a resist composition as set forth in item(1)or(2)which further contains a compound represented by the general formula[12]which generates an acid by irradiation:[12]