MANUFACTURING METHOD OF IONIZED WATER FOR CLEANING

摘要

PURPOSE: A manufacturing method of ionized water for cleaning having superior detergency which is used in the cleaning process in manufacturing semiconductor device or display device is provided. CONSTITUTION: The manufacturing method of ionized water for cleaning comprises the process of obtaining ionized water by electrolyzing an electrolyte prepared by adding acid, base, or both thereof to pure water, thereby extracting oxidized water gathered around the anode electrode and reduced water gathered around the cathode electrode respectively, wherein the electrolyte is NH4OH having concentration of 1 to 4 moles, the electrolyte is HCl having concentration of 1 to 4 moles, the oxidized water has pH of 2.8 to 4.0, and the reduced water has pH of 9.0 to 10.5.