发明名称 Improvements in or relating to methods of manufacturing silicon semi conductor devices
摘要 <p>The following alloys (percentages by weight) are used in the manufacture of transistors (see Division H1): 99.5% tin, 0.5% arsenic; 98% tin, 2% arsenic; 99.7% gold, 0.3% antimony.</p>
申请公布号 GB996295(A) 申请公布日期 1965.06.23
申请号 GB19610037528 申请日期 1961.10.19
申请人 PHILIPS ELECTRONIC AND ASSOCIATED INDUSTRIES LIMITED 发明人
分类号 C22C13/00;H01L21/00;H01L21/22;H01L21/228;H01L21/24;H01L21/48;H01L23/10;H01L23/14;H01L29/73 主分类号 C22C13/00
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