| 摘要 |
<p>A method for annealing a thin film, such as a ferroelectric or magnetic thin film comprising the steps of (i) taking a thin film 4 carried on a temperature sensitive substrate 6. The thin film having a radiation absorbing structure formed thereon, and (ii) illuminating the radiation absorbing structure 20 with a pulse 2 of radiation produced by a laser. The radiation absorbing structure is heated sufficiently by the pulse of radiation to anneal all or some of the thin film without exceeding the temperature budget of the temperature sensitive substrate. The method is used to fabricate an infra-red detector.</p> |
