摘要 |
Compounds of formula I, II or III , wherein X is a divalent radical; Y is C1-C6alkylene, cyclohexylene or a direct bond; Ar1 is an aromatic radical as defined in claim 1, R1 and R2 are each independently the other, inter alia, a radical of formula , in which p is zero or 1, or a radical of formula , R3 is, inter alia, hydrogen, C1-C12alkyl, C5-C12cycloalkyl or phenyl-C1-C3al kyl;R4 is, inter alia, C1-C12alkyl, C5-C12cycloalkyl, ph enyl-C1-C3alkyl or phenyl; or an acid addition salt of a compound of formula 1, II or III; are useful as photosensitive base catalysts in base crosslinking composition s.
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申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC. |
发明人 |
BIRBAUM, JEAN-LUC;KUNZ, MARTIN;NAKASHIMA, HIROKO;OKA, HIDETAKA;KURA, HISATOSHI;KIMURA, AKIRA |