发明名称 Semiconductor device and fabrication method thereof
摘要 A semiconductor device according to the present invention includes a first guard ring having conductivity of one of N and P types and a second guard ring formed adjacent to the first guard ring and having conductivity of the other type. The first guard ring is formed by a plurality of land shaped well regions each correspondingly to one cell or a plurality of I/O cells and at least one of the well regions is connected to a first power source line and ay least one of the remaining well regions is connected to a second power source line.
申请公布号 US6509617(B2) 申请公布日期 2003.01.21
申请号 US20010933159 申请日期 2001.08.21
申请人 ROHM CO., LTD. 发明人 HIRAGA NORIAKI
分类号 H01L23/58;H01L29/06;(IPC1-7):H01L29/76 主分类号 H01L23/58
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