HEAT-SENSITIVE COMPOSITION AND METHOD OF MAKING A LITHOGRAPHIC PRINTING FORM WITH IT

摘要

There is described coated on a lithographic base a complex of a developer- insoluble phenolic resin and a compound which forms a thermally frangible complex with the phenolic resin. This complex is less soluble in the develop er solution than the uncomplexed phenolic resin. However when this complex is imagewise heated the complex breaks down so allowing the non-complexed phenolic resin to the dissolved in the developing solution. Thus the solubility differential between the heated areas of the phenolic resin and t he unheated areas is increased when the phenolic resin is complexed. Preferably a laser-radiation absorbing material is also present on the lithographic base. A large number of compounds which form a thermally frangible complex with the phenolic resin have been located. Examples of such compounds are quinolinium compounds, benzothiazolium compounds, pyridinium compounds and imidazoline compounds.