发明名称 LASER MARKING DEVICE AND METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a laser marking device and method that shows a shallow machining depth and a superior visibility in marking, with a laser beam, an i-chip-exposed IC package such as a CSP and thin type electronic parts. SOLUTION: This is a laser marking device by which a workpiece 14 is irradiated with a laser beam 12 for pattern marking. The device is equipped with a laser generator 11 for outputting a laser beam, a diffraction device 18 by which the power density distribution of the laser beam outputted from the laser generator is converted to that of multiple peaks, and an image forming optical instrument 20 which guides, to the workpiece, the laser beam relating to the power density distribution with multiple peaks for image formation and which forms, as a pattern on the surface of the workpiece, a rugged part corresponding to the power density distribution with multiple peaks.</p>
申请公布号 JP2003019576(A) 申请公布日期 2003.01.21
申请号 JP20010206719 申请日期 2001.07.06
申请人 HITACHI CONSTR MACH CO LTD 发明人 SAKURAI SHIGEYUKI;MITSUYANAGI NAOKI;NAGANO YOSHIYA;MORITA TERU
分类号 G02B5/18;B23K26/00;B23K26/06;B23K26/073;B23K101/40;H01L21/02;(IPC1-7):B23K26/00 主分类号 G02B5/18
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