发明名称 |
Method for fabricating high-purity silica glass using sol-gel processing |
摘要 |
Disclosed is a method for fabricating high-purity silica glass using a sol-gel processing that includes the steps of: (a) mixing deionized water with a monomer and a dimer to prepare an aqueous premix solution; (b) mixing the aqueous premix solution with a fused silica and a dispersion agent; (c) mixing the resulting mixture to form a dispersed sol; (d) aging the dispersed sol at the ambient temperature to stabilize silica particles, and removing air voids from the sol; and, (e) adding a polymerization initiator and a gelation agent to the aged sol.
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申请公布号 |
US6508082(B2) |
申请公布日期 |
2003.01.21 |
申请号 |
US20000739159 |
申请日期 |
2000.12.18 |
申请人 |
SAMSUNG ELECTRONICS CO. LTD |
发明人 |
OH JEONG-HYUN;LEE MI-KYUNG |
分类号 |
C01B33/141;C03B8/02;C03B19/12;C03B20/00;C03C1/00;C03C3/06;(IPC1-7):C03B8/00 |
主分类号 |
C01B33/141 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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