SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND CONVEYING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which it is possible to reduce the size of a feed screw axis or a driving unit of a motor by balancing up-down pressure of platform, omit a pressure control valve and a control system of complex structure by communicating to atmosphere, prevent the entry of dust and lubricant gas within a hollow unit into a stand by room by separating the feed screw axis or guide rail from the stand by room by a first bellows and a second bellows, and prevent the bellows from being deformed due to the difference of pressure between inside and outside of the hollow unit by deformation prevention plates. SOLUTION: A first bellows 41 and a second bellows 42 are arranged on an upper portion and a lower portion of the platform of an boat elevator 20 installed in the stand by room of a load lock chamber 4 respectively, thus insides of hollow units of the first and second bellows, 41 and 42, are communicated to atmosphere pressure. A plurality of deformation prevention plates 45 are interposed in a vertical direction at same internals between the first and second bellows 41 and 42, with each deformation prevention plate 45 being guided by the plurality of auxiliary guide rails.