| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device which can easily extract the outline of even a pattern having a complicated outline shape. SOLUTION: A pattern unit 130 which the pattern inspection device 100 is equipped with, includes an image acquisition part 132 which obtains an image of a pattern P2 from SEM110, an ROI selection part 134 which generates a figure for inspection including at least one of a circular figure, an elliptic figure, a rectangular figure, a 1st rectangular figure having at least one of both the ends replaced with a semicircle, a semiellipse, or a parabola, and a 2nd rectangular figure having at least one of the four corners replaced with a quadrant or a quarter ellipse and having edge search directions previously defined for constitution part and defines ROI12 of a pattern P2 sectioned by the figure for inspection, and an outline extraction part 138 which searches for the edge of the pattern P2 according to the figure for inspection and obtains its outline information. |
