| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing system and method which makes effective use of a cleaning gas in cleaning a processing equipment, such as semiconductor manufacturing equipment. SOLUTION: The cleaning gas, which has been turned into a plasma by a radical generator 110 provided outside a chamber 101 of the processing equipment, is introduced into the chamber 101 to conduct cleaning. A circulation line 128 is provided to circulate a gas exhausted from the chamber 101 to make the exhausted gas reused. The circulation line 128 is provided with a trap 115 for trapping a reaction product in the gas, after cleaning.
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