发明名称 SUBSTRATE DRYER
摘要 PROBLEM TO BE SOLVED: To provide a substrate dryer for preventing mist generated by a drying treatment of a substrate 4 from adhering to the substrate again, after the dry treatment. SOLUTION: In the substrate dryer that has a drying treatment tank 2, and jets gas to a substrate which is conveyed by a conveyance roller 3 provided in the dry treatment tank from an air knife 7, a trap chamber 10 for accommodating mist which is generated by the flow of an air current is provided in the direction of the flow of the gas being generated by the jet of the gas on the sidewall of the dry treatment tank.
申请公布号 JP2003017463(A) 申请公布日期 2003.01.17
申请号 JP20010199118 申请日期 2001.06.29
申请人 SHIBAURA MECHATRONICS CORP 发明人 NISHIBE YUKINOBU;ISO AKINORI
分类号 G02F1/13;G02F1/1333;H01L21/304;(IPC1-7):H01L21/304;G02F1/133 主分类号 G02F1/13
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