发明名称 |
RESIST REMOVER COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist remover composition capable of easily removing photoresist residue at a low temperature in a short time. SOLUTION: The resist remover composition comprises an amine compound and an aldehyde compound having >=40 deg.C boiling point under ordinary pressure or at least one compound selected from equivalents of the aldehyde compound. |
申请公布号 |
JP2003015321(A) |
申请公布日期 |
2003.01.17 |
申请号 |
JP20010199619 |
申请日期 |
2001.06.29 |
申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
IKEMOTO KAZUTO;ABE HISAOKI;MARUYAMA TAKEHITO;AOYAMA TETSUO |
分类号 |
G03F7/42;H01L21/027;(IPC1-7):G03F7/42 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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