| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure device for photolithography, which is used for exposing and forming a picture of a photomask on a photosensitive material provided on the surface part of a base material to be processed as a latent image by exposing from the rear surface side where the picture of the photomask is not formed, in such a state in which a large size photomask is attached to a supporting frame, and with which the load of a worker is reduced in comparison with a conventional exposure device when a large size photomask is attached to or detached from the supporting frame and the sticking of dust to the photomask during working is reduced. SOLUTION: The exposure device for photolithography has a photomask discharging section which receives a used photomask in such a state in which the used photomask is arranged in a standing condition in nearly vertical direction from the supporting frame while nearly horizontally moving at the photomask hand-over position, holds and discharge the used photomask to a predetermined position when the photomask is exchanged, and a photomask feeding section which provides a photomask to be used next, conveys the photomask to a photomask receiving position and mounting the photomask on the supporting frame mentioned above in such a state in which the photomask is arranged in a standing condition in nearly vertical direction while nearly horizontally moving, when the photomask is used.</p> |
