| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide metal abrasives, capable of suppressing occurrence of damages on a polishing surface and suppressing dishing, by rapidly polishing the metal and to provide a metal abrasive composition, and to provide a method for polishing using them. SOLUTION: The metal abrasives comprises chelate resin particles, containing an aminocarboxylic acid or an iminodiacetic acid as functional groups, in such a manner that paired ions of the functional group are at least one type selected from among a group consisting of hydrogen ion and ammonium ion, represented by the formula<+> NR1 R2 R3 R4 , (wherein R1 , R2 , R3 and R4 are each independently a hydrogen atom, 1-5C saturated alkyl group or benzyl group).</p> |
