发明名称 METHOD AND APPARATUS FOR POSITIONING SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To fully cope with the shift to a larger and thinner plate of a substrate, finer and more precise process, and less dust in process, and positioning at high-speed and reliably. SOLUTION: A position and an inclination of a substrate 4 which are supported by a supporting means 20 from bottom thereof are imaged by cameras 10 at angles R and S, which are opposite with each other, for image recognition, and when a deviation in position or an inclination is recognized, the substrate 4 is positioned to a predetermined location by moving the supporting means 20 in the direction of X or Y axis, or around Z axis. At this time, intersections of an extension of a line connecting two points on one of the two sides in the substrate forming angles of the substrate 4 and an extension of a line connecting two points on other side are recognized as angles R and S, and image recognition is performed, based on which the substrate is positioned, thus above purpose is achieved.</p>
申请公布号 JP2003017545(A) 申请公布日期 2003.01.17
申请号 JP20010203499 申请日期 2001.07.04
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HARAGUCHI HIDEO;WATANABE MAMORU
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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