发明名称 METHOD OF MANUFACTURING III-V COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a high-quality III-V compound semiconductor with high reproducibility. SOLUTION: In a method of manufacturing a III-V compound semiconductor expressed by the general expression Inx Gay Alz N (x+y+z=1, 0<=x<=1, 0<=y<=1, 0<=z<=1) formed by organic metal vapor phase deposition method, (1) an In material is supplied before and/or after the III-V compound semiconductor is grown. (2) In the method described in (1), the In material is trimethly indium. The compound is a III-V compound semiconductor manufactured by the method described in either (1) or (2) (3). (4) The display unit is a display manufactured, using the III-V compound semiconductor described in (3).
申请公布号 JP2003017415(A) 申请公布日期 2003.01.17
申请号 JP20010200550 申请日期 2001.07.02
申请人 SUMITOMO CHEM CO LTD 发明人 IECHIKA YASUSHI;TSUCHIDA YOSHIHIKO;SHIMIZU SEIYA
分类号 C23C16/34;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/34
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