发明名称 |
ALIGNMENT METHOD, METHOD AND APPARATUS FOR EXPOSURE, AND METHOD FOR MANUFACTURING DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To improve alignment precision by obtaining an automatic selecting method for an alignment measurement sample shot which is not affected by the size for a alignment method for a plurality of reference layers. SOLUTION: By the alignment method for positioning an original plate and a substrate by measuring the position of a measurement mark at a plurality of shot positions on the substrate and statistically processing measured values, measurement marks which used for the alignment is selected individually when a plurality of measurement marks are present in the shot.</p> |
申请公布号 |
JP2003017386(A) |
申请公布日期 |
2003.01.17 |
申请号 |
JP20010198744 |
申请日期 |
2001.06.29 |
申请人 |
CANON INC |
发明人 |
HOSHI YASUSHI |
分类号 |
G01B11/00;G03F7/22;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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