发明名称 ALIGNMENT METHOD, METHOD AND APPARATUS FOR EXPOSURE, AND METHOD FOR MANUFACTURING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To improve alignment precision by obtaining an automatic selecting method for an alignment measurement sample shot which is not affected by the size for a alignment method for a plurality of reference layers. SOLUTION: By the alignment method for positioning an original plate and a substrate by measuring the position of a measurement mark at a plurality of shot positions on the substrate and statistically processing measured values, measurement marks which used for the alignment is selected individually when a plurality of measurement marks are present in the shot.</p>
申请公布号 JP2003017386(A) 申请公布日期 2003.01.17
申请号 JP20010198744 申请日期 2001.06.29
申请人 CANON INC 发明人 HOSHI YASUSHI
分类号 G01B11/00;G03F7/22;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G01B11/00
代理机构 代理人
主权项
地址