| 摘要 |
PROBLEM TO BE SOLVED: To provide a maskless exposure system for selectively exposing a photosensitive work surface. SOLUTION: The system is provided with a semiconductor substrate 29 having an elongated aperture 24. A series of shutters and guide means cooperating with the shutters are formed on the substrate by a prior wafer processing method. The shutters 33, 33A and 33B move between a first position covering an aperture 30 and a second position exposing the aperture. A series of corresponding actuators controlled by a computer has the configuration of a magnet coil 37, and collaborates with each shutter so as to selectively slide each shutter between its first position and its second position. A light beam is directed toward the aperture and the shutter forms a patterned light beam exiting the aperture. A computer-controlled stepper adjusts the relationship between the patterned light beam and the photosensitive work surface by synchronizing with the shutter actuators in order to direct the patterned light beam toward the different portions of work material. |
