| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing device/method for performing a uniform liquid processing in a whole substrate, even if it is large. SOLUTION: A developing processing unit(DEV) 24 has a first developing liquid supply zone 24b, where developing liquid is applied to the substrate G, a liquid cutting/rinse zone 24d where developing liquid is removed from the substrate G, to which developing liquid is applied and a roller transport mechanism 14 transporting the substrate G in one direction in an almost horizontal attitude. In the liquid cutting/rinse zone 24d, the substrate G is made in an inclined posture and developing liquid is made to flow out and rinse liquid is supplied to the substrate G, while a rinsing liquid discharge nozzle 52 is moved at prescribed speed along the surface of the substrate G kept in the inclined attitude. In the liquid cutting/rinse zone 24d, developing liquid can be removed from the substrate G. Thus, the occurrence of development unevenness is prevented, and line width uniformity is enhanced. |
