| 摘要 |
PROBLEM TO BE SOLVED: To grasp a change in base line quantity all the time without decreasing throughput. SOLUTION: An aligner which is equipped with a substrate stage 14 controlling the position of a substrate, a projection optical system 13 projecting the pattern of an original plate R on the substrate on the substrate stage for exposure, a 1st position detecting device 30 which detects the position of a reference mark FM on the substrate or the position of an alignment mark of the substrate, and 2nd position detecting devices 60a and 60b detecting the position of the reference mark FM through the projection optical system and positions the substrate according to the position detection result of the reference mark FM by the 1st and 2nd position detecting devices and the position detection result of the alignment mark by the 1st position detecting device has an index mark which can be detected by the 2nd position detecting device through the projection optical system on a member as the reference of the position detection by the 1st position detecting device. |
