PROXIMITY EXPOSURE DEVICE, AND METHOD OF CORRECTING DEFORMATION OF PHOTOMASK IN THE DEVICE

摘要

PROBLEM TO BE SOLVED: To realize high throughput by correcting the deformation of a photomask to stain high speed control of the proximity gap. SOLUTION: A predetermined proximity gap is formed between a base plate 1C to be exposed and a photomask 3A for forming a pattern by relatively moving an exposure chuck 2 holding the base plate 1C to a mask holder 3 having a photomask 3A and an airtight chamber 3D at the upper surface of the photomask 3A. At this time, detection means 13A1 to 13A5 detect deformation 3A" of the photomask 3A by detecting a gap between the photomask 3A and the base plate 1C. A control means 13 controls the pressure in the airtight chamber 3D according to the output of the detection means so that the deformation of the photomask is corrected.