PLASMA TREATMENT DEVICE, PLASMA TREATMENT SYSTEM AND ITS STABILIZATION METHOD

摘要

PROBLEM TO BE SOLVED: To realize reduction in the inductance and the power supply loss and suppression of the change with the passage of time at the coaxial cable part. SOLUTION: The device comprises a plasma treatment chamber 60 having electrodes 4, 8 for exciting plasma, a high frequency power source 1 for supplying high frequency power, and a plasma treatment-chamber unit 75 which comprises an input terminal and an output terminal PR and in which the high frequency power source 1 is connected to the input terminal through a high frequency power feeder 1A and the electrode 4 is connected to the output terminal PR through a high frequency power distributor 3A, and which is equipped with a matching circuit 2A for obtaining impedance matching between the plasma treatment chamber 60 and the high frequency power source 1. The high frequency power feeder 1A or the high frequency power distributor 3A is fixed at the floor GF by the high frequency impedance adjusters B1, B1 so that the high frequency impedance A, B may not fluctuate.