发明名称 DRY ETCHING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a dry etching apparatus having high flexibility of design. SOLUTION: A package 200, having an SAW element chip, is installed in a sub chamber 40 comprising a detachable lid 50 and a wiring board 30 being mounted on the outer wall of a main chamber 10, thus conveying the package 200 to the sub chamber 40 in the atmosphere, and hence increasing the flexibility of the design of a conveyance mechanism and of the entire apparatus.
申请公布号 JP2003017468(A) 申请公布日期 2003.01.17
申请号 JP20010196592 申请日期 2001.06.28
申请人 JAPAN RADIO CO LTD 发明人 SHINOHARA SHINICHI;TSUKUDA HIROYUKI;YATSUDA HIROMI;IIJIMA HIROAKI
分类号 H01L21/302;H01L21/3065;H03H3/10;(IPC1-7):H01L21/306 主分类号 H01L21/302
代理机构 代理人
主权项
地址