发明名称 RESISTANCE VALUE ADJUSTING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To effectively adjust a resistance value of a resistance material film of a resistor. SOLUTION: This resistance value adjusting method is capable of adjusting a resistance value of a film resistor in which a plurality of linear conductor films 1 are formed in parallel on a substrate, a resistance film 2 is formed over the width direction of the linear conductor film 1 which is a part of a plurality of linear conductor films 1, and a resistance value to be detected changes when an electrical contact is slid for over a plurality of linear conductor film 1. The trimming is performed for the width direction of the linear conductor films 1 when the resistance value is adjusted using, as single resistance material film, a resistance material film 2 formed to a first linear conductor film 1A formed to a management point where a first resistance value is detected when the electrical contact is slid and a second linear conductor film 1B formed, via this first linear conductor film 1A and a plurality of linear conductor films 1, to a management point where a second resistance value is detected when the electrical contact is slid.</p>
申请公布号 JP2003017306(A) 申请公布日期 2003.01.17
申请号 JP20010196962 申请日期 2001.06.28
申请人 YAZAKI CORP 发明人 NAGAKURA SHUNSUKE;OISHI MANABU;MARUO HISAFUMI
分类号 H01C17/22;G01F23/36;H01C10/44;H01C17/075;H01C17/235;(IPC1-7):H01C17/22 主分类号 H01C17/22
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