发明名称 PARTICLE REMOVAL SYSTEM
摘要 PROBLEM TO BE SOLVED: To electrically neutralize particles which are generated in a treatment apparatus for removal. SOLUTION: A treatment apparatus 100 performs specific treatments on a substrate. A radiation source 200 is generated, by performing specific treatment to the substrate in the treatment apparatus 100, applies particles having positive or negative charge to particles, that are generated by performing the specific treatment to the substrate in the treatment apparatus 100 and are being charged to neutralize the particle electrically. After that, a computer 300 controls a vacuum system (not shown) and the like, and sucks and removes the particles that have become neutral electrically.
申请公布号 JP2003017466(A) 申请公布日期 2003.01.17
申请号 JP20020186064 申请日期 2002.06.26
申请人 NEC CORP 发明人 MORIYA TAKESHI;UESUGI FUMIHIKO;ITO NATSUKO
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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