发明名称 ILLUMINATION OPTICAL DEVICE AND EXPOSURE DEVICE PROVIDED WITH THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an illumination optical device for carrying out deformed illumination while suppressing the loss of a light quantity satisfactorily even to light of a short wavelength with a simple structure having a small number of optical members. SOLUTION: The illumination optical device is provided with a light source means (1) for supplying almost parallel luminous flux, a first luminous flux conversion device (4) for converting the almost parallel luminous flux from the light source means into divergent luminous flux having a predetermined cross-sectional shape, a second luminous flux conversion device (5) for converting the divergent luminous flux from the first luminous flux conversion device into almost parallel luminous flux, an optical integrator (9) for forming a large number of light sources on the basis of the luminous flux through the second luminous flux conversion device, and an optical guiding optical system (10) for guiding the luminous flux from the large number of light sources to a surface (M) to be irradiated.
申请公布号 JP2003015314(A) 申请公布日期 2003.01.17
申请号 JP20010200283 申请日期 2001.07.02
申请人 NIKON CORP 发明人 SUENAGA YUTAKA
分类号 G02B19/00;G02B3/00;G02B27/00;G02F1/13;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G02B19/00
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