| 摘要 |
PROBLEM TO BE SOLVED: To provide a member for a vitreous carbon coated ion implantation apparatus where foreign matters do not stick on a silicon wafer, since pure ion beam can be implanted to a silicon wafer without inclusion of foreign matters in ion beam, and which is superior in durability, since a glass-like carbon film applied to a substrate will not peel readily. SOLUTION: In the member for a vitreous carbon coated ion implantation apparatus, at least a substrate surface irradiated with an ion beam is coated with a vitreous carbon film. In the surface of the vitreous carbon film, regular reflectance of light injected at an angle of 30 degrees with respect to the surface of the vitreous carbon film is 10% or more, average roughness Ra by JIS B 0601 is 0.03 to 3μm, and maximum roughness Rmax is 0.3 to 30μm.
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