发明名称 INJECTOR FOR GLASS SUBSTRATE OF FOR WAFER TREATMENT
摘要 PROBLEM TO BE SOLVED: To provide an injector for glass substrate treatment that can treat, especially dry a glass substrate, without damaging the substrate by utilizing mechanical force and chemical force. SOLUTION: The injector comprises a jet section 120 for jetting vaporized IPA and solvent vapor, a supply section 111 for recycling fluid that was allowed to remain after use or new fluid (new liquid), and a generator 109 for vaporizing the IPA and solvents. At the jet section, a pressure tank 103 is provided. In the pressure tank 103, a discharge port 101 for discharging the IPA that has been vaporized once and solvent vapor is formed, and at the same time, entrance guides 105a and 105b are formed at both side ends, so that a glass substrate 100 can freely move in and out. The supply section conveys the fluid remaining, on the side of the outlet guide of the pressure tank via a pump 117 and comprises a boiling machine 113 for boiling the conveyed fluid and a condenser 115. In the generator, a heating machine and a supply apparatus are arranged in the inside, the IPA and solvent are heated and supplied, thus carrying out the supply to the glass substrate via the discharge port.
申请公布号 JP2003017462(A) 申请公布日期 2003.01.17
申请号 JP20010195951 申请日期 2001.06.28
申请人 DMS CO LTD 发明人 JUM LYUL HAN
分类号 G02F1/1333;B08B3/02;B08B3/08;B08B7/00;H01L21/00;H01L21/304;(IPC1-7):H01L21/304;G02F1/133 主分类号 G02F1/1333
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